报道,中国28nm光刻机年底交货,老美要限制自己国家公司搞RISC-V

billwanhua

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193nm immersion scanners can natively create 36nm with no multi-patterning tricks, with multi-patterning you can halve that (Known as pitch doubling, or even pitch quad, or any of various multiple industry terms), single application of this will enable print size of ≈18nm at the expense of additional processing steps (that come with added defects and error propagation). if you apply multipattern multiple times you can achieve sub 10nm. Not sure anyone has done more than a 2x cycle of this as it is quite cost prohibitive and errors multiply. I expect this scanner is only able to achieve 28nm class performance with multi-patterning or they are twisting logic and printing 36nm lines and calling it 28nm class.

If you want to know how good US semi fabs got at patterning, look at 2D Planar fab shrinkage which was actually accurate on marketing, IE true resolution unlike the current TSMC/Intel/Samsung Logic marketing terms. For NAND it was continously verified by actual chip teardowns/deprocessing.
2D NAND ran in to scaling issue, hence the change to stacking/3D. Any tech becomes more costly to go smaller (multiple patterning tricks vs EUV) and NAND memory cells degrade as you go smaller, playing with smaller number of electrons leading to less cycles before failure with each subsequent shrink. Hence all NAND players transitioned to 3D stacking after they got as much performance as possible from the 14-16nm range.


28nm可以刻sub 10nm ,应该相当于荷兰duv
 
最后编辑:

Jack Kang, vice president of business development at SiFive, a Santa Clara, California-based startup using RISC-V, said potential U.S. government restrictions on American companies regarding RISC-V would be a "tremendous tragedy."

"It would be like banning us from working on the internet," Kang said. "It would be a huge mistake in terms of technology, leadership, innovation and companies and jobs that are being created."

Regulating the open discussion of technologies is rarer than regulating physical products, but not impossible, said Kevin Wolf, an export-control attorney at law firm Akin Gump who served in the Commerce Department under former President Barack Obama. Existing rules on chip exports could help provide a legal framework for such a proposal, Wolf said.

当年RISC -v 确实有先见之明,为了防止老美长臂,把联盟总部搬到了瑞士


老美实力出众,Open source 也管。

美国公司不准搞,会不会欧洲中国搞了一个RISC-V芯片联盟?那就成了怪胎了
 
最后编辑:
美国在搞自杀,中国不能跟着学
 

老美要限制自己国家公司搞RISC-V。​



疯子狠起来连自己都砍 。
 
最后编辑:

法国否决了加拿大核电相关公司卖给美国公司,因为怕法国核电出口中国受限。
法国这么牛能管这个?
 

法国否决了加拿大核电相关公司卖给美国公司,因为怕法国核电出口中国受限。
法国这么牛能管这个?

去年cineplex在大略的法院把英国的cineworld给告了,按说cineworld在加拿大根本就没business,完全可以无视你,但是人家真的就来应诉了,还完完整整的把官司打完。大略法院判cineworld赔偿1.2billion,cineworld过了段时间就宣布破产了。我看这些西方国家在这些事情上基本上不耍流氓,还都是尊重法律的。
 
去年cineplex在大略的法院把英国的cineworld给告了,按说cineworld在加拿大根本就没business,完全可以无视你,但是人家真的就来应诉了,还完完整整的把官司打完。大略法院判cineworld赔偿1.2billion,cineworld过了段时间就宣布破产了。我看这些西方国家在这些事情上基本上不耍流氓,还都是尊重法律的。
尊重法律的一个原因是美英加澳等国互相承认彼此的司法判决
 
去年cineplex在大略的法院把英国的cineworld给告了,按说cineworld在加拿大根本就没business,完全可以无视你,但是人家真的就来应诉了,还完完整整的把官司打完。大略法院判cineworld赔偿1.2billion,cineworld过了段时间就宣布破产了。我看这些西方国家在这些事情上基本上不耍流氓,还都是尊重法律的。
现在去印度试试是不是尊重法律:jiayou:

老美出台很多行政制度,比喻制裁,算不算法律?

企业跟企业可以讲法律,加拿大出台了一个法律,被谷歌Facebook狂虐
 

193nm immersion scanners can natively create 36nm with no multi-patterning tricks, with multi-patterning you can halve that (Known as pitch doubling, or even pitch quad, or any of various multiple industry terms), single application of this will enable print size of ≈18nm at the expense of additional processing steps (that come with added defects and error propagation). if you apply multipattern multiple times you can achieve sub 10nm. Not sure anyone has done more than a 2x cycle of this as it is quite cost prohibitive and errors multiply. I expect this scanner is only able to achieve 28nm class performance with multi-patterning or they are twisting logic and printing 36nm lines and calling it 28nm class.

If you want to know how good US semi fabs got at patterning, look at 2D Planar fab shrinkage which was actually accurate on marketing, IE true resolution unlike the current TSMC/Intel/Samsung Logic marketing terms. For NAND it was continously verified by actual chip teardowns/deprocessing.
2D NAND ran in to scaling issue, hence the change to stacking/3D. Any tech becomes more costly to go smaller (multiple patterning tricks vs EUV) and NAND memory cells degrade as you go smaller, playing with smaller number of electrons leading to less cycles before failure with each subsequent shrink. Hence all NAND players transitioned to 3D stacking after they got as much performance as possible from the 14-16nm range.


28nm可以刻sub 10nm ,应该相当于荷兰duv
可能等交货之后再说吧
现在评价太早
 
现在去印度试试是不是尊重法律:jiayou:

老美出台很多行政制度,比喻制裁,算不算法律?

企业跟企业可以讲法律,加拿大出台了一个法律,被谷歌Facebook狂虐

可能加拿大确实弱?欧盟罚苹果,google什么的,都是乖乖交钱。
 
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