中国申请 5nm 芯片直接蚀刻专利。弯道丢弃光刻机

ASML的Cymer EUV光源难道不是大功率的plasma?还要等清华来做救世主?LOL
中国的这个功率大的多,不是个便于出口的机器,是占地不小的环形加速场。
 
最后编辑:
人可以不喜欢任何人和事,但是不应该因此蒙上自己的眼睛。
 
2年前如果告诉你,华为只需要2两年就能突破美帝封锁,造出7nm 5G手机,你肯定不信。

5nm 芯片直接蚀刻,笑话。

当年制作半导体收音机线路板的技术。
 
外行看热闹,如果清华这个项目成功,也就是解决EUV光源问题,离EUV光刻机还有一段距离,最乐观估计四年造出EUV光刻机,戏有点长。。。
 
外行看热闹,如果清华这个项目成功,也就是解决EUV光源问题,离EUV光刻机还有一段距离,最乐观估计四年造出EUV光刻机,戏有点长。。。


时间紧,任务重,两年就能。
 

China plans to build a giant chip factory driven by particle accelerator
Scientists said this unprecedented technology can overstep US sanctions and make China a new leader in semiconductor chip industry
Plans are now in progress to construct a huge particle accelerator to help researchers put into practice the cutting-edge technology


China is exploring new avenues to bypass restrictions on lithography machines, which are used in the production of microchips. Using particle accelerators to create a novel laser source, researchers are laying the foundation for the future of semiconductor fabrication.Plans are now under way to construct a particle accelerator with a circumference between 100-150 metres (328-492 feet) – roughly the size of two basketball courts. The accelerator’s electron beam will transform into a high-quality light source for on-site chip manufacturing and scientific inquiry.
 
这个也能产生大功率X射线,至少理论上比EUV分辨率更高。
能不能利用大功率X射线直接刻蚀还需要探讨。
 
蚀刻机是尹志尧整的。也是做芯片的很重要一环。好像水平已经达到3nm。他有100多项专利。
 
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