低级红。
以前有报道,即使现有已交付的光刻机,如果出台了限制,ASML 也不能提供后续售后服务,而光刻机有很多易耗品,比喻光源。
如果得罪了ASML可不是什么好事,让ASML有钱赚才是好事。
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Exclusive: China to launch $40 billion state fund to boost chip industry
China is set to launch a new state-backed investment fund that aims to raise about $40 billion for its semiconductor sector, two people familiar with the matter said, as the country ramps up efforts to catch up with the U.S. and other rivals.www.reuters.com
中国又追加了400亿美元芯片政府投资。不比美帝差钱
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Chinese breakthrough in advanced semiconductor may bring edge amid US ban
Proposed casting method is relatively simple and shorter, making it suitable for automated control and aiding future production.amp.scmp.com
第四代半导体突破还是吹牛?
A team from Zhejiang University has made strides using a self-developed approach. Led by Yang Deren, a member of the Chinese Academy of Sciences and director of Zhejiang University’s State Key Laboratory of Silicon Materials, the team produced 4-inch wafers in August, improving on their 2-inch wafers from May last year. Moreover, their process is more simple, controllable and cost effective.
Zhang found that for third generation and beyond wide band gap semiconductor materials, most are synthesised through vapour-phase methods. In contrast, gallium oxide is the only material that can form single crystals by solidifying from a melt at standard atmospheric pressure, helping to cut fabrication costs and thus aid mass production. “In Japan and America, a modelling method is commonly used. However, this method requires a large amount of iridium to make the crucible. Typically, a 4-inch gallium oxide crucible would need at least 5kg [11lbs] of iridium,” he said.
“Given that the price of iridium is almost three times that of gold, the method significantly increases the cost of gallium oxide. Moreover, a foreign method could potentially lead to international intellectual property disputes,” Zhang said.
这公司有2、30 年了吧。美国政府好歹得有自己的独立实验室吧,不可能靠一个ottawa的startup提供这种信息吧
这公司有2、30 年了吧。
继华为手机mate 60后,禁止公务员工把苹果手机带到工作地。苹果在中国增加了近百万工作机会。中国仍拿它开刀。具体是什么能使中国敢在华为手机发布后对苹果上下手,也许如上面的链接所述, 在材料上有突破,DUV就不是问题了。慢慢会披露的。![]()
Chinese breakthrough in advanced semiconductor may bring edge amid US ban
Proposed casting method is relatively simple and shorter, making it suitable for automated control and aiding future production.amp.scmp.com
第四代半导体突破还是吹牛?
A team from Zhejiang University has made strides using a self-developed approach. Led by Yang Deren, a member of the Chinese Academy of Sciences and director of Zhejiang University’s State Key Laboratory of Silicon Materials, the team produced 4-inch wafers in August, improving on their 2-inch wafers from May last year. Moreover, their process is more simple, controllable and cost effective.
Zhang found that for third generation and beyond wide band gap semiconductor materials, most are synthesised through vapour-phase methods. In contrast, gallium oxide is the only material that can form single crystals by solidifying from a melt at standard atmospheric pressure, helping to cut fabrication costs and thus aid mass production. “In Japan and America, a modelling method is commonly used. However, this method requires a large amount of iridium to make the crucible. Typically, a 4-inch gallium oxide crucible would need at least 5kg [11lbs] of iridium,” he said.
“Given that the price of iridium is almost three times that of gold, the method significantly increases the cost of gallium oxide. Moreover, a foreign method could potentially lead to international intellectual property disputes,” Zhang said.